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Nanofabrication INTERVIEW
Micro writer ML3
IBE - Scia Systems Mill 150
ALD - Ultratech/CambridgeNanoTech Fiji 200
CPD -Tousimis Autosamdri®-815B, Series B
DEKTAK-XT
DRIE - Oxford PlasmaPro100
DWL - Heidelberg Instruments
EVAPORATOR - Bestec GmbH - e-beam PVD system
LASER-DICER Oxford Lasers A-Series
FUMEHOODS
KAUFMAN - Bestec GmbH - sputtering PVD system
LAURELL-NANO - Laurell - WS-650-23 B spincoater
MAGNETRON - Bestec GmbH - sputtering PVD system
MINIEVAP - Ångstrom Engineering - co-evaporation PVD system
MIRA-EBL - Tescan/Raith - SEM/E-beam writer with LIS
NANOCALC - Ocean Optics - Reflectometer
PARYLENE - SCS - Labcoater 2 Parylene Deposition System (PDS 2010)
PECVD - Oxford PlasmaPro100
RAITH - Raith Nanofabrication - RAITH150 Two
RIE - flourine - Oxford PlasmaPro 80
RIE-chlorine - Oxford PlasmaPro100
SUSS-MA8 - SUSS MicroTec - Mask Aligner
SUSS-RCD8 Microtech GmbH
SUSS-WETBENCH MicroTech GmbH.
XeF2 Etching of Silicon